Pressure parameter can be seen everywhere in vacuum system, which refers to the vertical force of gas on the surface of solid or liquid, and it is synonymous with pressure in vacuum system.
The most common pressure parameter is naturally the limit pressure. Limit pressure is one of the main parameters of vacuum pump performance in vacuum system. Popular understanding is that in the process of vacuum system pumping, after a long time of pumping, when the pumping speed of vacuum pump or vacuum unit is 0 or the pressure parameters of vacuum chamber are always maintained at a certain value, that is the limit pressure of vacuum pump or vacuum unit.
The second is work pressure. Working pressure is the pressure parameter necessary to ensure the process implementation and product quality in the enterprise production process. In the process of vacuum equipment selection, in order to meet the process requirements, the limit pressure of the equipment will be about an order of magnitude lower than the working pressure.
Foundation pressure. In some process fields or technicians, the base pressure is also called background pressure, which refers to the pressure in the vacuum chamber when the production process begins to be implemented. For example, magnetron sputtering applications may need to pump the local pressure to 10-4 PA, while the working pressure of sputtering process may be about 1 PA.
Residual pressure. In some cases, residual pressure is the same as the limit pressure, which refers to the total pressure of residual gas in the vacuum chamber after a period of pumping operation of vacuum pump or vacuum unit. If the vacuum system has no pumping speed at this time, the residual pressure is the limit pressure of vacuum pump or vacuum unit.
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