Application of vacuum pump system in electric vacuum industry

Because the working principle of various electric vacuum devices is based on electric and magnetic fields to control the movement of electrons in space so as to enlarge, oscillate and display images. And vacuum pump system can prevent the electrons and the collision of gas molecules, ensure that the movement of electrons in the space, to avoid poisoning launch thermionic cathode oxidation, smoking inside the electronic devices into different requested for vacuum electronic devices (vacuum degree and guarantee the normal work of the electronic device.piston-vacuum-pump-air-ballast-valve

Application:

1. Research on vacuum and decaying surface physics:

For general vacuum research, the main purpose of the vacuum analysis mass spectrometer is to analyze the residual gases in the vacuum system. And research on the surface, are now gradually to vacuum mass spectrometer and low energy electron diffraction, auger electron spectrometer, secondary ion mass spectrometer, chemical analysis and electron spectrometer and field emission microscope and other instruments used in combination, to study under low pressure vacuum physical process. The partial pressure side volume is usually carried out at 10-9pa or lower pressure. Because the vacuum system used is mostly the vacuum pump without oil or less oil, the mass spectrometer is not required to have a wide quality range.
pplication-of-vacuum-pump-system-in-electric-vacuum-industry
2. Special devices:

Such as electron microscope, X ray tube, a cathode ray tube and the residual gas analysis of large vacuum electronic devices (uhf) in this type of application, don't like surface physics, need to test so low partial pressure, and hope that the instrument has a wide range of quality of work, at least has the ability of vacuum pump oil cracking object can be detected.

3. Film technology:

It is necessary to use the vacuum analyzer to control the process of film preparation. In the process, the main purpose is to reduce the residual gas atmosphere to prevent oxidation. The purity of the charged gas, such as the impurity of hydrogen and oxygen, is emphasized in sputtering process.the-principle-of-anti-return-device-for-vacuum-pump