multi-stage Roots vacuum pump in chemical process

The continuous development of chemical processes, especially in the semiconductor and solar industries, continues to place new demands on the Roots vacuum pumps used. Based on the reliable technology of multi-stage Roots pumps, gas throughput, particle tolerance and condensation resistance at process pressure have been significantly improved compared to previous pump solutions.

As with the general process series pumps, the demanding process pumps are equipped with temperature control and inert gas flushing systems. However, the range of parameters used to optimize process regulation is broader than that used for general process series pumps.

The pump series uses the other three models in the series and is supplemented by a Roots pump for increased pumping speed and gas throughput over the process pressure range. Due to the use of special materials, the corrosive gas equipment of these pumps makes it possible to use strong oxidizing agents such as NF3. The pump's wide temperature range allows it to adapt to a variety of different processes, such as tungsten deposition at low temperatures or nitride deposition at high temperatures. Efficient motors produce energy savings at low pressures and, due to their high torque, provide good start-up performance after pump shutdown.

Thanks to their identical interface and the same media connection, the series for demanding process series is ideally compatible with pumps for general process series. This means that if process changes occur on existing production equipment, an optimized pump solution can be obtained by replacing the pump with minimal installation work.

The use of a third-stage Roots-assisted harsh process pump model provides a compact, extremely powerful pumping station with maximum pumping speed for CVD processes. The variable speed controlled Roots pump is used on the dry run process pump. The Roots pump has a rated pumping speed of 4,500 m3 · h-1 in its own frame. Thanks to the modular construction, the installation is easy and the individual pumps in the pumping station can be removed separately and maintained in the event of maintenance work. The inlet-side Roots pump frequency converter allows process parameters to be adjusted over a wide range of gas throughputs and allows for a variety of process gases.

What-is-a-rough-vacuum-system

Vacuum-Pump-Structure

vacuum-pumps-maintenance-guidelines

Roots-Vacuum-Pump-Prevent-Overload-Measures

Vacuum-Pump-System-Selection